Nation's major achievements listed in global top 10

By ZHANG ZHIHAO | CHINA DAILY | Updated: 2021-12-15 07:15
Share
Share - WeChat
Employees are seen working on the final assembly of ASML's TWINSCAN NXE:3400B semiconductor lithography tool with its panels removed, in Veldhoven, Netherlands, on April 4, 2019. Extreme ultraviolet lithography systems was listed among this year's Global Top Ten Engineering Achievements. Extreme ultraviolet lithography systems use high-energy ultraviolet light with a wavelength of 13.5 nm to reduce the dimensions of process nods during transistor manufacturing to 7.5 nm or even 3 nm. In 2019, the Dutch comply ASML announced its new-generation lithography system, which represents the most advanced fifth-generation lithography system. This system can extend the physical limits of Moore's Law to a new height. [Photo/Agencies]
|<< Previous 1 2 3 4 5 6 7 8 9 10 Next   >>|
Previous 7/10 Next
Photo

Chatting with President Xi on AI

Kenya's bush-to-brew tours

Labor behind the world's tallest bridge in Guizhou

Delivering social benefits

Shenzhou XIX crew returns safely to 'beautiful, blue' Earth

Ordinary work, extraordinary workers

Related Stories

Top
BACK TO THE TOP
English
中文
Copyright 1995 - . All rights reserved. The content (including but not limited to text, photo, multimedia information, etc) published in this site belongs to China Daily Information Co (CDIC). Without written authorization from CDIC, such content shall not be republished or used in any form. Note: Browsers with 1024*768 or higher resolution are suggested for this site.
License for publishing multimedia online 0108263

Registration Number: 130349
About China Daily
Advertise on Site
Contact Us
Job Offer
Expat Employment
FOLLOW US