Nation's major achievements listed in global top 10

By ZHANG ZHIHAO | CHINA DAILY | Updated: 2021-12-15 07:15
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Employees are seen working on the final assembly of ASML's TWINSCAN NXE:3400B semiconductor lithography tool with its panels removed, in Veldhoven, Netherlands, on April 4, 2019. Extreme ultraviolet lithography systems was listed among this year's Global Top Ten Engineering Achievements. Extreme ultraviolet lithography systems use high-energy ultraviolet light with a wavelength of 13.5 nm to reduce the dimensions of process nods during transistor manufacturing to 7.5 nm or even 3 nm. In 2019, the Dutch comply ASML announced its new-generation lithography system, which represents the most advanced fifth-generation lithography system. This system can extend the physical limits of Moore's Law to a new height. [Photo/Agencies]
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